An AMC Filter is specifically designed to remove airborne molecular contaminants that cannot be captured by conventional particulate filtration. In modern manufacturing, these invisible molecules can severely impact product performance, process stability, and equipment reliability. The contaminants that an AMC filter can remove generally fall into several categories. Acidic gases such as HF, HCl, NOx, SOx, and organic acids are known to corrode metal surfaces, damage optical coatings, and interfere with semiconductor lithography. Basic gases like NH₃ can cause defects in photoresist layers or affect sensitive chemical reactions.
Organic compounds including VOCs, outgassing fumes, and solvent vapors may cause haze formation, film irregularities, or unexpected chemical interactions. In addition to these groups, an AMC filter can also target oxidizing gases, sulfur compounds, and special molecules released from building materials, packaging, or equipment. Since these contaminants exist at extremely low concentrations, often measured in parts-per-billion, they require specialized filtration media to capture and neutralize them. Advanced AMC filter systems use activated carbon, catalytic materials, and chemisorption technology based on tailored formulations. By removing these gases, the filtration system ensures stable production environments, protects machine components, and supports high-yield manufacturing processes. Whether used in semiconductor fabs, LCD plants, pharmaceutical cleanrooms, or precision optics workshops, an AMC filter plays a key role in maintaining product consistency and preventing molecular-level failures.
