Yield improvement is one of the most important performance indicators in semiconductor fabrication facilities. As process nodes advance and device structures become increasingly complex, even minor environmental fluctuations can lead to significant yield loss. While particle control has long been a core focus of cleanroom design, airborne molecular contamination has emerged as a hidden but powerful yield killer. This is where amc filtration plays a decisive role.AMC filtration improves yield by addressing contaminants that are invisible, difficult to measure, and capable of interacting chemically with sensitive materials. Unlike particles, molecular contaminants can diffuse freely, adsorb onto surfaces, and participate in unwanted reactions during critical process steps. Without effective amc air filtration, these reactions can occur repeatedly and unpredictably, leading to cumulative yield loss over time.One of the primary ways amc filtration improves yield is by stabilizing photolithography performance. Modern lithography relies heavily on chemically amplified photoresists that are extremely sensitive to airborne bases such as ammonia and amines. Even trace concentrations can neutralize photoacids, resulting in incomplete exposure, pattern collapse, or linewidth variation. By removing these basic contaminants through amc air filtration, fabs can achieve consistent resist behavior, improved pattern fidelity, and reduced rework rates.Corrosion control is another critical yiel