Semiconductor manufacturing is one of the most contamination-sensitive industrial processes in the world.As device geometries shrink to the nanometer scale,even the slightest chemical imbalance in the cleanroom environment can affect yield,reliability,and long-term device performance.This is why the AMC filter has become a core component in semiconductor fabs,where controlling airborne molecular contaminants is just as critical as controlling particles.In semiconductor fabrication facilities,airborne molecular contaminants originate from a wide range of sources.These include process chemicals,exhaust backflow,building materials,outdoor air intake,and human activity.Common AMC species found in fabs include acidic gases,basic compounds,dopants,and organic vapors.Unlike particles,these molecular contaminants can easily penetrate conventional HEPA filtration and directly interfere with wafer processing steps.One of the most important applications of AMC filters in semiconductor manufacturing is corrosion control.Advanced fabs contain a large amount of sensitive metal components,including copper interconnects,aluminum structures,and precision sensors.Acidic AMCs such as sulfur compounds and nitrogen oxides can cause micro-corrosion on metal surfaces,leading to electrical failures and tool instability.By installing AMC filters in air handling systems,these corrosive gases are adsorbed before they reach critical areas.Lithography processes are particularly vulnerable to airborne mol

